Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Silicon Planar Sputtering Target
Grade / formula: Si
Made to Order
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Technical Specifications
| Material | Silicon |
|---|---|
| Formula / designation | Si |
| Form | Sputtering Target |
| Target configuration | Planar |
| Deposition method (reference) | DC, RF |
| Bonding options | Indium, Elastomer |
| Purity options | |
| Size options |
View all 19 options |
| Shape options | Rectangular |
| Density (reference) | 2.32 g/cm³ |
| Melting point (reference) | 1,410 °C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Photovoltaic thin films
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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Please request the SDS for your specific material and configuration.
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Silicon Planar Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.