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Basis Materials representative image of Strontium Iron Oxide Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Strontium Iron Oxide Sputtering Target

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Specifications and availability are confirmed during quotation.

Strontium Iron Oxide Sputtering Target is a source material for physical vapor deposition by sputtering. The Strontium Iron Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.

Technical specifications

Material familyCeramic / Compound
Constituent elementsSr, Fe, and O
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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