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Representative image of Tantalum Niobium Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Tantalum Niobium Target

Made to Order

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Specifications and availability are confirmed during quotation.

Tantalum Niobium Target brings the specified material system into a sputtering source for thin-film deposition. The Tantalum Niobium Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.

Technical specifications

Material familyMetal Alloy
Constituent elementsTa and Nb
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Tantalum Niobium Target is included automatically. Tell us the form, size and quantity you need; other details are optional.