Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Overview
Technical Specifications
| Material | Tantalum Oxide |
|---|---|
| Form | Sputtering Target |
| Deposition method (reference) | RF, RF-R |
| Bonding options | |
| Purity options | |
| Size options |
View all 11 options |
| Formula option | Ta2O5 |
| CAS number | 1314-61-0 |
| Shape options | Discs, Plates, Column Targets, Step Targets |
| Density (reference) | 8.2 g/cm³ |
| Melting point (reference) | 1,872 °C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Optical coatings
- Protective coating development
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
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Tantalum Oxide Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.