Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Tantalum Silicide (TaSi2) Sputtering Target
Grade / formula: TaSi2
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
For sputtered thin-film work, Tantalum Silicide (TaSi2) Sputtering Target provides the named material in target form. The TaSi2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | TaSi2 |
| Constituent elements | Ta and Si |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Tantalum Silicide (TaSi2) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.