Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Tantalum Sputtering Target
Grade / formula: Ta
Made to Order
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Technical Specifications
| Material | Tantalum |
|---|---|
| Chemical symbol | Ta |
| Form | Sputtering Target |
| Deposition method (reference) | DC |
| Bonding options | Indium, Elastomer |
| Purity options | |
| Size options |
View all 16 options |
| Shape options | Disc, Planar |
| Standard atomic weight (reference) | 180.95 ± 0.01 |
| Density (reference) | 16.4 g/cm³ |
| Melting point (reference) | 3017 °C |
| Thermal conductivity (reference) | 57 W/m.K |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Optical coatings
- Photovoltaic thin films
- Magnetic thin-film studies
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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Please request the SDS for your specific material and configuration.
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