Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Tin Oxide (SnO2) Sputtering Target
Grade / formula: SnO2
Made to Order
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Technical Specifications
| Material | Tin Oxide (SnO2) |
|---|---|
| Formula / designation | SnO2 |
| Form | Sputtering Target |
| Deposition method (reference) | RF, RF-R |
| Bonding options | Elastomer |
| Purity options | |
| Size options |
View all 11 options |
| CAS number | 18282-10-5 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Molar mass (formula reference) | 150.708 g/mol |
| Density (reference) | 6.95 g/cm³ |
| Melting point (reference) | 1,630 °C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Optical coatings
- Photovoltaic thin films
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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Tin Oxide (SnO2) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.