Skip to content
Representative image of Tin Silver Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Tin Silver Sputtering Target

Made to Order

Request a quote

Overview

Tin Silver Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Technical specifications
Material Tin Silver
Form Sputtering Target
Purity options
  • ≥99%
  • 99.9%
  • 99.99%
Shape options Discs, Plates
Deposition method (reference) DC
Production process Vacuum melting + precision machining
Bonding options Indium (standard); copper backing plate optional
Thickness 3.175 mm, 6.35 mm, or custom
Density (reference) ≈7.4 g/cm³ (varies with composition)
Melting point (reference) 221°C (eutectic Sn96.5/Ag3.5)
Electrical resistivity (reference) ≈12 µΩ·cm

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Photovoltaic thin films

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Tin Silver Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.