Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Titanium Silicide Planar Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Titanium Silicide Planar Target brings the specified material system into a sputtering source for thin-film deposition. The Titanium Silicide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Constituent elements | Ti and Si |
| Form | Sputtering Target |
| Custom options available | true |
| Target configuration | Planar |
| Availability | Made to Order |
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Titanium Silicide Planar Target is included automatically. Tell us the form, size and quantity you need; other details are optional.