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Titanium Silicide (Ti5Si3) Sputtering Target
Grade / formula: Ti5Si3
Made to Order
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Titanium Silicide (Ti5Si3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Ti5Si3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | Ti5Si3 |
| Constituent elements | Ti and Si |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Titanium Silicide (Ti5Si3) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.