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Basis Materials representative image of Titanium Silicon Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Titanium Silicon Sputtering Target

Made to Order

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Specifications and availability are confirmed during quotation.

For sputtered thin-film work, Titanium Silicon Sputtering Target provides the named material in target form. The Titanium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.

Technical specifications

Material familyMetal Alloy
Constituent elementsTi and Si
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Titanium Silicon Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.