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Representative image of Tungsten Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Tungsten Sputtering Target

Grade / formula: W

Made to Order

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Specifications and availability are confirmed during quotation.

Tungsten Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Tungsten is a refractory metal with a high melting point. It may be specified for high-temperature materials research and thin-film coating studies. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.

Technical specifications

Material familyPure Metal
Material / GradeW
ElementW
Constituent elementsW
FormSputtering Target
AvailabilityMade to Order

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