Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Overview
Technical Specifications
| Material | Vanadium Dioxide |
|---|---|
| Form | Sputtering Target |
| CAS number | 12036-21-4 |
| Purity options | ≥99% |
| Shape options | Discs |
| Deposition method (reference) | RF |
| Bonding options | Indium, Elastomer |
| Density (reference) | 4.57 g/cm³ |
| Melting point (reference) | 1970 °C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
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Tell us what you need
Vanadium Dioxide Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.