Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Aluminum Nitride (AlN) Sputtering Target
Grade / formula: AlN
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Aluminum Nitride (AlN) Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum nitride is a ceramic valued for thermal conductivity and electrical insulation. Common areas of inquiry include electronic and functional-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | AlN |
| Constituent elements | Al and N |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Aluminum Nitride (AlN) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.