Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Silicon Dioxide (SiO2) Sputtering Target
Grade / formula: SiO2
Made to Order
Request a quoteOverview
Silicon Dioxide (SiO2) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.
Technical Specifications
| Material | Silicon Dioxide (SiO2) |
|---|---|
| Formula / designation | SiO2 |
| Form | Sputtering Target |
| Deposition method (reference) | RF |
| Bonding options | |
| Purity options | |
| Size options |
View all 17 options |
| CAS number | 7631-86-9 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 3.175 mm, 6.35 mm |
| Molar mass (formula reference) | 60.083 g/mol |
| Thermal conductivity (reference) | ≈1.4 W/(m·K) |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Optical coatings
- Photovoltaic thin films
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
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Tell us what you need
Silicon Dioxide (SiO2) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.