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Basis Materials representative image of Indium Tin Oxide (ITO) Sputtering Targets

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Indium Tin Oxide (ITO) Sputtering Targets

Grade / formula: ITO

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Specifications and availability are confirmed during quotation.

Indium Tin Oxide (ITO) Sputtering Targets is a source material for physical vapor deposition by sputtering. Indium tin oxide is a conductive oxide used in transparent electrode research. Common areas of inquiry include transparent conductive-film studies. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.

Technical specifications

Material familyCeramic / Compound
Material / GradeITO
Constituent elementsIn, Sn, and O
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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