Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Aluminum Oxide Planar Sputtering Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Aluminum Oxide Planar Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum oxide is an electrically insulating ceramic. Common areas of inquiry include dielectric and protective coating research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Constituent elements | Al and O |
| Form | Sputtering Target |
| Custom options available | true |
| Target configuration | Planar |
| Availability | Made to Order |
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Aluminum Oxide Planar Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.