Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Overview
Technical Specifications
| Material | Aluminum Oxide |
|---|---|
| Form | Sputtering Target |
| Target configuration | Planar |
| Purity options | |
| Deposition method (reference) | RF-R |
| Bonding options | |
| Size options |
View all 13 options |
| CAS number | 1344-28-1 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Density (reference) | 3.97 g/cm³ |
| Melting point (reference) | 2,072 °C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Display thin-film research
- Transparent conductive coatings
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
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Aluminum Oxide Planar Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.