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Basis Materials representative image of Aluminum Oxide (Al2O3) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Aluminum Oxide (Al2O3) Sputtering Target

Grade / formula: Al2O3

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Aluminum Oxide (Al2O3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum oxide is an electrically insulating ceramic. It may be specified for dielectric and protective coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.

Technical specifications

Material familyCeramic / Compound
Material / GradeAl2O3
Constituent elementsAl and O
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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