Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
For sputtered thin-film work, Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target provides the named material in target form. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Researchers may consider this material for multi-principal-element materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.
Technical specifications
| Material family | High-Entropy Alloy (HEA/MPEA) |
|---|---|
| Constituent elements | Co, Cr, Fe, Ni, and Mn |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.