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CoCrFeNiAl High Entropy Alloy Sputtering Target
Grade / formula: CoCrFeNiAl
Made to Order
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CoCrFeNiAl High Entropy Alloy Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. It may be specified for multi-principal-element materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | High-Entropy Alloy (HEA/MPEA) |
|---|---|
| Material / Grade | CoCrFeNiAl |
| Constituent elements | Co, Cr, Fe, Ni, and Al |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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CoCrFeNiAl High Entropy Alloy Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.