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Representative image of Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target

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Specifications and availability are confirmed during quotation.

For sputtered thin-film work, Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target provides the named material in target form. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Researchers may consider this material for multi-principal-element materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.

Technical specifications

Material familyHigh-Entropy Alloy (HEA/MPEA)
Constituent elementsCo, Ni, and V
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.