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Aluminum (Al) Sputtering Target
Grade / formula: Al
Made to Order
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Aluminum is a lightweight, electrically conductive metal. Aluminum (Al) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.
Technical Specifications
| Material | Aluminum (Al) |
|---|---|
| Chemical symbol | Al |
| Form | Sputtering Target |
| Purity options | |
| Deposition method (reference) | DC |
| Bonding options | |
| Size options |
View all 18 options |
| CAS number | 7429-90-5 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Standard atomic weight (reference) | 26.982 ± 0.001 |
| Density (reference) | 2.70 g/cm³ |
| Melting point (reference) | 660.323 °C |
| Thermal conductivity (reference) | 235 W/m.K |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Display thin-film research
- Optical coatings
- Photovoltaic thin films
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
Tell us what you need
Aluminum (Al) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.